Wet dust removal device and dedusting process of trichlorosilane-Iota

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Service > Wet dust removal device and dedusting process of trichlorosilane

Wet dust removal device and dedusting process of trichlorosilane

The invention discloses a wet dedusting device and dedusting process of trichlorosilane, the trichlorosilane synthesis gas into the dust in the distillation column, under certain operating pressure, light group of trichlorosilane synthesis gas in the rise of enrichment by vapor pipeline connected into the condenser; the condenser adopts partial condensation, vapor phase by the monomer mixture outlet recovery, liquid return to dust distillation column, the reflux ratio is 0.2-0.8; trichlorosilane synthesis gas in restructuring impurities with reflux liquid drops to dust in the dust distillation tower, reflux distillation tower continuous vaporization condensation time, finally enters the stirred tank heated, stirred tank vapor return dust distillation tower, the residual liquid discharged from the non vaporization residue in mining. The invention by wet dust get remove high boiling material trichlorosilane synthesis gas, to facilitate subsequent processing, simple process, at the same time, less loss, low energy consumption, effectively solve the subsequent production of blockage, easy production process is continuous and stable.

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